Next-generation EUV lithography platform built around a miniaturized particle accelerator that doubles transistor density and triples scanner throughput.
Inversion Semiconductor is developing a semiconductor lithography machine that shrinks particle accelerators 1000x to create a high-power EUV light source at 13.5nm. The platform delivers a 100% increase in transistor density at the same numerical aperture, 3x higher throughput per scanner with the capability to power multiple scanners, and greater than 25% improvement in critical dimension uniformity. It is designed to reshore advanced chip fabrication in the West. Inversion Semiconductor is a product of Inversion Semiconductor.